CAS: 4109-96-0; Dichlorosilicon

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CAS号80-10-4 二苯基二氯硅烷 | CAS号75-54-7 甲基二氯硅烷 | CAS号75-79-6 甲基三氯硅烷 | CAS号10025-78-2 三氯氢硅 | CAS号1333-74-0 氢 | CAS号10026-04-7 四氯化硅 | CAS号18236-12-9 trimethyl-silan... | CAS号7647-01-0 盐酸 | CAS号7440-21-3 硅 | CAS号115-10-6 二甲醚 | CAS号3937-28-8 烯丙基二氯硅烷 | CAS号542-91-6 二乙基硅烷 | CAS号871-64-7 正己基二氯硅烷 | CAS号7440-21-3 硅 | CAS号7783-61-1 四氟化硅 | CAS号13824-36-7 Difluorosilane | CAS号13465-71-9 trifluorosilane | CAS号1333-74-0 氢 | CAS号10026-04-7 四氯化硅 | CAS号98-13-5 苯基三氯硅烷

甲基二氯硅烷置于四丁基氯化膦体系中,用 四氯化硅,氮 作为反应溶剂,化学反应生成 二氯硅烷
参考文献:Organic Chlorohydrosilane And Method For Preparing Them
标题:Organic Chlorohydrosilane And Method For Preparing Them
摘要:提供的是一种有机氯硅烷,这是制备硅聚合物的有用起始物质,以及制备该物质的方法.更具体地说,本发明通过使用季铵有机磷盐化合物作为催化剂,在一种可以以廉价且简便的方式获得的氯硅烷的si-h键与另一种有机氯硅烷的si-cl键之间进行交换反应,从而使得能够高产率合成各种新型有机氯硅烷.由于催化剂在使用后可以回收并重复使用,因此本发明非常经济,对于大规模生产硅原材料非常有效.

专利信息

专利号:US-2010173100-A1
优先权日:2006-01-16
标题 :Method for the synthesis of product molecules
发明人：WEISS HORST; GERBER GUSTAV; NUERNBERGER PATRICK HENNING; WOLPERT DANIEL STEPHAN
权利人:BASF AG
摘要:The invention relates to a method for the synthesis of product molecules, wherein ultrashort laser pulses shaped with the aid of a pulse shaper are generated and a gas which contains educt molecules is fed onto a surface, on which the educt molecules are at least partially adsorbed, the shaped ultrashort laser pulses being directed onto the surface in order to control a reaction process for synthesis of the product molecules from educts adsorbed on the surface.

专利号:US-2025043431-A1
优先权日:2021-11-30
标 题 :Hybrid chemical-physical vapor deposition process for the synthesis of environmental barrier coatings
发明人：CHEN DIANYING; WIDRIG BENO; RAMM JUERGEN
权利人:OERLIKON SURFACE SOLUTIONS AG PFAEFFIKON
摘要:A manufacturing process for the synthesis of environmental barrier coating system (EBC) which protect Si-based Ceramic Matrix Composite (CMC) material against oxidation and volatilization at high temperatures is disclosed. The manufacturing process is carried out in vacuum and includes steps of depositing a silicon bond coat and an oxygen containing barrier coating. The process is supported by plasma, preferably through and arc discharge, which lead to full dissociation of the gas precursors such as silane. Plasma is as well used for pre-treatment of substrates in an uninterrupted process chain. A deposition system with essential vacuum and plasma components is disclosed as well as EBC coatings manufactured by the process.

专利号:US-2023192731-A1
优先权日:2020-05-29
标 题 :Process for the stepwise synthesis of silahydrocarbons
发明人：AUNER NORBERT; STURM ALEXANDER G; SANTOWSKI TOBIAS; FELDER THORSTEN
权利人:MOMENTIVE PERFORMANCE MAT INC
摘要:The invention relates to a process for the stepwise synthesis of silahydrocarbons bearing up to four different organyl substituents at the silicon atom, wherein the process includes at least one step a) of producing a bifunctional hydridochlorosilane by a redistribution reaction, selective chlorination of hydridosilanes with an ether/HCl reagent, or by selective chlorination of hydridosilanes with SiCl 4 , at least one step b) of submitting a bifunctional hydridochloromonosilane to a hydrosilylation reaction, at least one step c) of hydrogenation of a chloromonosilane, and a step d) in which a silahydrocarbon compound is obtained in a hydrosilylation reaction.

专利号:US-2025197431-A1
优先权日:2023-12-15
标 题:Methods and systems for forming a layer comprising silicon and composition and synthesis of silicon precursor
发明人：ROMERO PATRICIO EDUARDO; VERVUURT RENÉ HENRICUS JOZEF; DEZELAH CHARLES; PORE VILJAMI J
权利人:ASM IP HOLDING BV
摘要:Disclosed are methods and systems for forming a silicon-containing layer on a substrate. Further disclosed are composition and synthesis of silicon-containing precursor. The methods for forming a silicon-containing layer comprise executing a plurality of deposition cycles. A deposition cycle comprises a first precursor pulse that comprises exposing the substrate to a first precursor. The first precursor comprises a molecule comprising a P—Si bond. A deposition cycle further comprises a plasma pulse that comprises exposing the substrate to a plasma treatment. The plasma treatment comprises generating a plasma.

专利号:US-6479599-B1
优先权日:1997-04-04
标题:Catalyst system for high yield synthesis of polyolefins
发明人：PEIL KEVIN P; WILSON DAVID R
权利人:BP CHEM INT LTD
摘要:This invention relates to a supported metallocene catalyst system for the high yield synthesis of polyolefins, to methods of preparation of the catalyst system, to polymerization processes which use the catalyst system and to polyolefin polymers produced by the polymerization processes.

专利号:US-2010213643-A1
优先权日:2009-02-26
标 题:Rapid synthesis of polycrystalline silicon sheets for photo-voltaic solar cell manufacturing
发明人：GADGIL PRASAD N; ROYCHOUDHURY RAJAT; MULLA MUSHTAQ; BANERJEE INDRAJIT
权利人:GADGIL PRASAD N; ROYCHOUDHURY RAJAT; MULLA MUSHTAQ; BANERJEE INDRAJIT
摘要:A simple and direct methodology for synthesis of polycrystalline silicon sheets is demonstrated in our invention, where silica (SiO 2 ) and elemental carbon (C) are reacted under RF or MW excitation. These polycrystalline silicon sheets can be directly used as feedstock/substrates for low cost photovoltaic solar cell fabrication. Other techniques, such as textured polycrystalline silicon substrate formation, in situ doping, and in situ formation of p-n junctions, are described, which make use of processing equipments and scheme setups of various embodiments of the invention.