CAS: 928-98-3; 1,5-Pentanedithiol

相似化合物

1191-43-1 1191-62-4 3489-28-9

上下游产品

CAS号6008-51-1 dithiepane | CAS号111-24-0 1,5-二溴戊烷 | CAS号628-76-2 1,5-二氯戊烷 | CAS号628-77-3 1,5-二碘戊烷 | CAS号603-35-0 三苯基膦 | CAS号193691-27-9 trimethyl(3-pen... | CAS号329685-67-8 1,5-bis(3-trime... | CAS号13265-54-8 trimethylstanny... | CAS号1613-51-0 硫化环戊烷 | CAS号6008-51-1 dithiepane | CAS号54410-63-8 1,5-双-(甲基硫代)-戊烷

1,5-二氯戊烷置于sodium Hydrogensulfide,乙醇体系中,化学反应生成 1,5-戊二硫醇
参考文献:Stocken,Journal Of The Chemical Society,1947,P. 594
标题:Stocken,Journal Of The Chemical Society,1947,P. 594

专利信息

专利号:US-2024309024-A1
优先权日:2023-03-14
标题 :Direct synthesis of alkenylhalosilanes
发明人：LEWIS KENRICK MARTIN; ZHU YANJUN; BYRNE CHRISTOPHER M
权利人:MOMENTIVE PERFORMANCE MAT INC
摘要:A process for the direct synthesis of alkenylhalosilane monomers. Forming a slurry of liquid and copper-activated silicon from fresh silicon, cyclone fines and/or fine dust from silicon grinding, ultrafines and/or spent contact mass from the Direct Synthesis of alkylhalosilanes and arylhalosilanes, in a thermally stable solvent. Reacting the silanes by agitating the slurry with at least one unsaturated aliphatic or cycloaliphatic organohalide of the formula R1X, and optionally an organohalosilane and/or hydrogen halide, in the presence of a polymerization inhibiting Lewis base additive, at a reaction time, temperature and pressure effective to produce alkenylhalosilanes having the formulae, R1SiHX2, R12SiHX, R13SiX, R1SiX3, and R12SiX2 or mixtures thereof.

专利号:US-9920160-B2
优先权日:2014-09-03
标题 :Method for synthesis of polymer containing multiple epoxy groups
发明人：GAO CHAO; ZHENG YAOCHEN; PENG LI; CAI SHENGYING; WENG ZHULIN
权利人:UNIV ZHEJIANG
摘要:A method for a synthesis of a polymer containing multiple epoxy groups includes steps of: under protection of nitrogen or argon, with a photosensitive free radical initiator under an ultraviolet light irradiation, initiating a mixture of a dithiol compound and alkynyl glycidyl ether or other alkynyl-containing compounds to proceed a thiol-yne polymerization, so as to obtain the polymer. The number of the epoxy groups is able to be adjusted through changing a type of a dithiol monomer, a mixing ratio of the dithiol monomer, and a mixing ratio between the alkynyl glycidyl ether and other alkynyl compounds. The present invention has advantages of: fast reaction, convenient process, easy post-processing, a large number of the epoxy groups, and adjustable and controllable content. The obtained polymer has a wide potential application in fields of coating, adhesive, ink, encapsulating material, resin for composite material, additive, high performance material, function material, and so on.

专利号:US-3978140-A
优先权日:1974-09-23
标题 :Process for the preparation of carbinols
发明人：LANE CLINTON FISHER; MYATT HAL LESLIE
权利人:ALDRICH BORANES INC
摘要:Organic compounds containing a carboxylic acid or carboxylic acid anhydride group are reduced when contacted with an alkali metal borohydride and a boron trihalide in a liquid medium in which diborane is soluble in the form of a labile borane adduct. Hydrolysis of the reaction mixture then provides a useful synthesis of the corresponding carbinols. n The alkali metal borohydride-boron trihalide reagent may either be preformed and reacted subsequently with an organic compound containing a carboxylic acid or anhydride group, or the alkali metal borohydride-boron trihalide reagent may be produced in the presence of an organic compound containing a carboxylic acid or anhydride group. This development makes it possible to synthesize a wide variety of carbinols which are valuable and useful intermediates in organic synthesis.

专利号:WO-2012164484-A1
优先权日:2011-05-30
标 题:Adenosine or deoxyadenosine derivatives modified at position 8 and a method of synthesis thereof
发明人：CAPOBIANCO MASSIMO LUIGI; NAVACCHIA MARIA LUISA
权利人:CONSIGLIO NAZIONALE RICERCHE; CAPOBIANCO MASSIMO LUIGI; NAVACCHIA MARIA LUISA
摘要:New derivatives of adenosine and deoxyadenosine modified at position 8 of the purine ring, of general formula (I) are described, which are suitable to be conjugated with functional molecules such as chromophores, fluorophores and intercalating residues, and suitable to be incorporated within synthetic oligonucleotides. A method for the synthesis of the above-mentioned derivatives is also described, which allows the obtainment thereof in high yields and by simple methods. Formula (I), wherein Z is selected from (a) and (b).

专利号:US-2019211134-A1
优先权日:2016-08-19
标 题 :Thiourethane polymers, method of synthesis thereof and use in fused filament fabrication printing
发明人：ELLSON GREGORY T; LUND BENJAMIN R; VOIT WALTER
权利人:BOARD OF REGENTS THE UNIV OF TEXAS; ADAPTIVE 3D TECH
摘要:A thermoplastic thiourethane polymer comprising a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. The first type of monomer includes two or more thiol functional groups and the type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anhydrous aprotic solvent-dissolved anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7.

专利号:US-10899072-B2
优先权日:2016-03-15
标题:Thiourethane polymers, method of synthesis thereof and use in additive manufacturing technologies
发明人：ELLSON GREGORY T; LUND BENJAMIN R; VOIT WALTER
权利人:UNIV TEXAS; ADAPTIVE 3D TECH; BOARD OF RESENTS THE UNIV OF TEXAS SYSTEM
摘要:A semi-crystalline thiourethane polymer. The semi-crystalline thiourethane polymer comprises a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. Each of the first type of monomer includes two or more thiol functional groups and each of the second type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7, produced by photo-initiated decomposition of a photolatent base. A method of synthesizing, and polymer jetting and stereolithography methods of manufacturing a polymer part, are also disclosed.