CAS: 66003-76-7; Diphenyliodonium Trifluoromethanesulfonate

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CAS号591-50-4 碘苯 | CAS号1493-13-6 三氟甲烷磺酸 | CAS号71-43-2 苯 | CAS号1483-73-4 二苯基溴化碘鎓 | CAS号2926-30-9 三氟甲磺酸钠 | CAS号3240-34-4 碘苯二乙酸 | CAS号358-23-6 三氟甲磺酸酐 | CAS号1483-72-3 氯代二苯碘鎓 | CAS号2923-28-6 三氟甲烷磺酸银 | CAS号98-80-6 苯硼酸 | CAS号39515-51-0 间苯氧基苯甲醛 | CAS号5668-93-9 3-乙基联苯 | CAS号1812-51-7 2-乙基-1,1'-联苯 | CAS号5707-44-8 4-乙基联苯 | CAS号2042-85-5 1,2-diphenylpro... | CAS号93-55-0 苯丙酮 | CAS号1429-05-6 4-硝基-苯甲酸 苯基酯 | CAS号4714-21-0 4-甲基二苯乙烯 | CAS号946-80-5 苄基苯基醚 | CAS号1927-71-5 1-Butanol, 4-phenoxy

Fluoro[trifluoromethanesulfonyloxy-λ3-Iodanil]Benzene置于正丁基锂体系中,用 乙醚,正己烷,二氯甲烷,甲苯 作为反应溶剂,化学反应 0.25H,反应生成 二苯基碘三氟甲烷磺酸盐
参考文献:(E)-[(β-(三氟甲磺酰氧基)乙烯基](苯基)碘鎓三氟甲磺酸酯与芳基和炔基锂试剂的高效配体交换反应反应生成二芳基和炔基碘鎓三氟甲磺酸酯
标题:(E)-[(β-(三氟甲磺酰氧基)乙烯基](苯基)碘鎓三氟甲磺酸酯与芳基和炔基锂试剂的高效配体交换反应反应生成二芳基和炔基碘鎓三氟甲磺酸酯
摘要:(E)-[β-(三氟甲烷磺酰氧基)-乙烯](苯基)碘鎓三氟甲磺酸盐与芳基和炔基锂试剂的反应反应生成了芳基(苯基)和炔基(苯基)碘鎓三氟甲磺酸盐,产率高且选择性好.这些反应表明,配体交换在超价碘原子处高效进行,并提供了另一种合成二芳基和炔基碘盐的方法.
DOI:10.1055/s-2000-6234

专利信息

专利号:US-2023294064-A1
优先权日:2015-12-28
标 题:Substrates, systems, and methods for nucleic acid array synthesis
发明人：RAJASEKARAN JOHN J
权利人:VIBRANT HOLDINGS LLC
摘要:Disclosed herein are formulations, substrates, and arrays for the synthesis of PNA chains and PNA-DNA chimera on microarrays. In some embodiments, the formulations include a photo-protective compound that shields any PNA monomers, PNA polymers, or PNA-DNA chimera already attached to a microarray from radiation exposure during the synthesis of the PNA or PNA-DNA chains. In some embodiments, substrates and arrays comprise a porous or a planar layer for synthesis and attachment of PNA or DNA monomers, or PNA or PNA-DNA polymers. In some embodiments, disclosed herein are formulations and methods for high efficiency coupling of PNA monomers or PNA polymers to a microarray substrate.

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:KR-102325534-B1
优先权日:2019-10-11
标题 :Synthesis of Sulfones and Sulfonyl Derivatives using Sodium (tert-butyldimethylsilyl)oxymethanesulfinate

专利号:US-10118892-B2
优先权日:2012-10-12
标 题:Compounds and their synthesis
发明人：ARSTAD ERIK; SANDER KERSTIN; GENDRON THIBAULT
权利人:UCL BUSINESS PLC
摘要:The present invention relates to sulfonium salts of formula (I): (I), their preparation, and utility as precursors for preparing functionalized organic compounds, wherein R 1 and R 2 are the same or different and each is independently selected from an optionally substituted aryl group, an optionally substituted alkynyl group, an optionally substituted alkenyl group, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted cycloalkenyl group, an optionally substituted aralkyl group, an optionally substituted arylalkenyl group, an optionally substituted heteroaryl group, an optionally substituted heterocyclyl group, an optionally substituted amine, an optionally substituted alkoxy group, an optionally substituted thioether group, an optionally substituted phosphine group, an optionally substituted boron species, an optionally substituted carbene, an organometallic moiety, and a halide, or R 1 and R 2 are joined together to form an optionally substituted sulfur-containing ring; W is a bond, an optionally substituted alkynylene group, an optionally substituted alkenylene group, and optionally substituted alkylene group, an optionally substituted heterocyclyl group, an optionally substituted aryl group or an optionally substituted heteroaryl group; R 3 is a moiety comprising at least one basic group, provided that when R 3 does not contain any carbon atoms, W is not a bond; X is an anionic species; and n is an integer selected from 1 to 5.

专利号:KR-20090102733-A
优先权日:2006-12-27
标 题 :Method for synthesis of hyperbranched polymer, hyperbranched polymer, resist composition, semiconductor integrated circuit, and method for production of semiconductor integrated circuit

专利号:KR-20090103860-A
优先权日:2006-12-28
标题:Process for synthesis of hyperbranched polymer, hyperbranched polymer, resist compositions, semiconductor integrated circuits, and process for production of semiconductor integrated circuits