专利号:US-6544657-B1 优先权日:1999-10-12 标题 :Synthesis of oligosilazane-containing compounds for the production of a ceramic-like material 发明人:MOTZ GUNTER; STENZEL FRAUKE; ZIEGLER GUNTER 权利人:FED STATE OF BAVARIA GERMANY A 摘要:The invention concerns a synthesis method for an oligosilazane-containing condensation product comprising the following step: n conversion of oligosilazane composition with an average molecular weight of no more than 1000 g/mol, n with a dialk(en)ylamino compound of the following formula (I) n n n A[N(R 4 ) 2 ] m   (I) n n n in which A is at least one element chosen from B, Al, Ti, Zr, and Hf, R 4 is an alkyl group or alkenyl group and m is the valence of element A, n in which the reaction is run so that an average of 1.6-2.2 mol HN(R 4 ) 2 per mol of dialk(en)ylamino compound of formula (I) is split off; n an oligosilazane-containing condensation product obtained according to this method; a method for production of a substrate coated or infiltrated with a ceramic-like material, comprising the following steps: n coating or infiltration of the substrate with a solution of the aforementioned oligosilazane-containing condensation product, evaporation of the product and curing of the oligosilazane-containing condensation product, n as well as a coated or infiltrated substrate obtained according to this method.
专利号:US-11782210-B2 优先权日:2021-04-08 标题:Sensing and/or protection layers for optical fiber-based sensors using atomic layer deposition synthesis on optical fibers 发明人:OHODNICKI JR PAUL RICHARD; LEE JUNG-KUN; LIU YULIN; WRIGHT RUISHU; LU FEI; WUENSCHELL JEFFREY 权利人:UNIV OF PITTSBURGH—OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION 摘要:A method of making an optical fiber-based sensor includes providing an optical fiber, and providing a sensing or protection layer on a surface of the optical fiber by an atomic layer deposition (ALD) process.
专利号:US-6616972-B1 优先权日:1999-02-24 标题 :Synthesis of metal oxide and oxynitride 发明人:SENZAKI YOSHIHIDE; HOCHBERG ARTHUR KENNETH; CUTHILL KIRK SCOTT 权利人:AIR PROD & CHEM 摘要:A method for producing a material selected from the group consisting of metal oxide, metal oxynitride and mixtures thereof on a substrate, comprising; reacting a first reactant selected from the group consisting of (R 1 R 2 N) x M(â•?NR 3 ) y , (R 4 R 5 N) x M[η 2 —R 6 Nâ•?C (R 7 )(R 8 )] y and mixtures thereof with an oxidant and up to 95 volume percent of a source of nitrogen selected from the group consisting of ammonia, N 2 O, NO, NO 2 , alkyl amines, N 2 H 2 , alkyl hydrazine, N 2 and mixtures thereof, to produce said material on said substrate, where R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are individually C 1-6 alkyl, aryl or hydrogen, Mâ•?Ta, Nb, W or Mo or mixtures thereof, and when Mâ•?Ta or Nb, x=3 and y=1 and when Mâ•?W or Mo, y=x=2.
专利号:US-5597935-A 优先权日:1994-06-01 标题 :Synthesis of ansa-metallocene catalysts 发明人:JORDAN RICHARD F; DIAMOND GARY M 权利人:UNIV IOWA RES FOUND 摘要:A process of preparing in high yield ansa-metallocene complexes and rac ansa-metallocene complexes by reacting an ansa-bis-cyclopentadiene compound with a metal amide complex.
专利号:US-8900467-B1 优先权日:2013-05-25 标 题 :Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis 发明人:CHAPUIS YVES-ANDRE; RUIZ RICARDO; WAN LEI 权利人:HGST Netherlands BV 摘要:A method for making a chemical contrast pattern uses directed self-assembly of block copolymers (BCPs) and sequential infiltration synthesis (SIS) of an inorganic material. For an example with poly(styrene-block-methyl methacrylate) (PS-b-PMMA) as the BCP and alumina as the inorganic material, the PS and PMMA self-assemble on a suitable substrate. The PMMA is removed and the PS is oxidized. A surface modification polymer (SMP) is deposited on the oxidized PS and the exposed substrate and the SMP not bound to the substrate is removed. The structure is placed in an atomic layer deposition chamber. Alumina precursors reactive with the oxidized PS are introduced and infuse by SIS into the oxidized PS, thereby forming on the substrate a chemical contrast pattern of SMP and alumina. The resulting chemical contrast pattern can be used for lithographic masks, for example to etch the underlying substrate to make an imprint template.
专利号:US-6489258-B1 优先权日:1997-04-15 标 题 :Synthesis and application of vapor grafted porous materials 发明人:YING JACKIE Y; MEHNERT CHRISTIAN P 权利人:MASSACHUSETTS INST TECHNOLOGY 摘要:This invention provides an article, compositions, methods of making and uses of vapor-deposited metal compounds immobilized on porous substrates. The substrate is a porous substrate having an average pore size of at least about 8 â„« and a surface area of at least about 10 m 2 /g. The methods describe the vapor-deposition of an inorganic compound onto the substrate where the deposition is accomplished with a relatively small amount of ligand loss. The substrate can be pre-treated to achieve a uniformly dispersed metal compound deposited on the substrate. The inorganic compound can decompose into a metal compound. The article can also function as a catalyst for carbon-heteroatom coupling reactions such as carbon-carbon coupling reactions, most notably, the Heck reaction.
[参考文献]: Matthew T Mcdowell, Et Al. The Influence Of Structure And Processing On The Behavior Of Tio2 Protective Layers For Stabilization Of N-Si/tio2/ni Photoanodes For Water Oxidation. Acs Appl Mater Interfaces. 2015 Jul 22;7(28):15189-99.
合成参考文献
摘要:Ipaktschi, J.; Saidi, M. R., Science of Synthesis Knowledge Updates, (2012) 4, 459. 摘要:Ye, Z.-S., Science of Synthesis Knowledge Updates, (2021) 2, 330.