专利号:US-5679773-A 优先权日:1995-01-17 标题 :Reagants and methods for immobilized polymer synthesis and display 发明人:HOLMES CHRISTOPHER P 权利人:AFFYMAX TECH NV 摘要:Compounds and methods for solid phase synthesis of organic molecules including peptides, oligonucleotides, benzodiazepines, beta -turn mimetics, and prostaglandins. The present invention provides new reagents in the form of linking groups and resins and substrates having attached linking groups which are useful in solid phase synthesis of high density arrays of organic molecules. The invention also provides methods which increase yields of various organic synthesis strategies.
专利号:US-2018150597-A1 优先权日:2016-11-29 标题 :Method for optimal design of polynucleotides sequences for analysis of specific events in any genetic region of interest 发明人:BERTHOUMIEUX SARA; FOURNE YANNICK; KOMATSU JUN; FER FREDERIC; BENSIMON AARON 权利人:GENOMIC VISION SA 摘要:Methods including in-silico steps for design and synthesis of Genomic Morse Code (“GMCâ€?) probes including design of combinations of polynucleotide sequences and labelling colors for analysis of large rearrangements in targeted genetic regions as well as allele characterization of complex regions and localization of events such as replication, DNA reparation or epigenetics in particular regions. Color-encoded sets of probes that produce characteristic or unique color patterns when painted on a target nucleic acid sequence. Methods for using color-encoded sets of probes.
专利号:US-2006257560-A1 优先权日:2004-12-30 标 题 :Polymer surfaces for insitu synthesis of polymer arrays 发明人:BARONE ANTHONY D; LI HANDONG; MCGALL GLENN H 权利人:AFFYMETRIX INC 摘要:In one aspect of the present invention polymers are used to create films providing three-dimensional array substrates. The films were stable and presented good hydroxyl group numbers as compared with arrays without polymer films. It is an object of the present invention that three dimensional arrays substrates provide a means to obtain higher density polymer arrays.
专利号:US-2005080260-A1 优先权日:2003-04-22 标 题 :Preparation of prodrugs for selective drug delivery 发明人:MILLS RANDELL L; WU GUO-ZHANG 摘要:Synthesis of a chemical compound having the formula A-B-C that may serve for applications such as drug delivery where A is a chemiluminescent, moiety, B is a photochromic moiety, and C is a biologically active moiety where A-B-C may serve as a prodrug. Novel synthetic methods of the present invention to form the prodrug comprised the steps of (1) forming a benzophenone, (2) forming a diaryl ethylene, (3) attaching a phthalimide moiety to at least one of the aryl groups of the ethylene to form a phthalimide-ethylene conjugate, (4) condensing two ethylene-phthalimide conjugates to form a phthalimide-pentadiene conjugate, (5) converting the phthalimide to the phthalhydrazide by reaction with hydrazine to form a carrier compound according to the present invention, and (6) reacting the carrier compound with an nucleophilic moiety of the drug to form the corresponding prodrug. Alternatively the carrier can be prepared by using the halo-substituted diaryl ethylene to make the corresponding cationic leuco dye-like compound with known methods. The cationic compound then is protected by reacting with a nucleophile and coupled with the aminophathalimide by palladium-catalyzed amination to form the protected phthalimide-pentadiene conjugate. The latter is refluxed with hydrazine to convert its phthalimide to the phthalhydrazide and acidified to give the carrier. An additional aspect of the present invention relates to the use of these compounds as antiviral agents for the treatment of viral infections such as HIV and as anticancer agents for the treatment of cancers such as bowel, lung, and breast cancer.
专利号:US-8053161-B2 优先权日:2006-09-25 标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition 发明人:WADA KENJI; SAEGUSA HIROSHI 权利人:FUJIFILM CORP 摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.
专利号:US-9709891-B2 优先权日:2005-12-09 标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition 发明人:KANDA HIROMI; KANNA SHINICHI 权利人:FUJIFILM CORP 摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.