CAS: 1569-01-3; 1-Propoxypropan-2-Ol

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Toluene-4-Sulfonic Acid 2-Hydroxypropyl Ester 以55%的收率获得
参考文献:Isibasi,Sigehki;Nakamura,Kodzaburo;Nakaxata,Masaaki;Nehgisi,Takaaki;U+
标题:Isibasi,Sigehki;Nakamura,Kodzaburo;Nakaxata,Masaaki;Nehgisi,Takaaki;U+

专利信息

专利号:US-2014342177-A1
优先权日:2011-12-07
标 题 :Synthesis of cupronickel nanowires and their application in transparent conducting films
发明人：WILEY BENJAMIN
权利人:UNIV DUKE
摘要:A method of synthesis to produce a conductive film including cupronickel nanowires. Cupronickel nanowires can be synthesized from solution, homogeneously dispersed and printed to make conductive films (preferably < 1,000 Ω/sq) that preferably transmit greater than 60% of visible light.

专利号:US-7312251-B2
优先权日:1999-04-26
标题 :Synthesis of stable solutions of rare earth tris (organophosphate) in hydrocarbon solvents
发明人：YUNLU KENAN; HE MIN
权利人:RHODIA RARE EARTHS INC
摘要:Stable rare earth tris (organophosphate) solutions comprise a rare earth tris (organophosphate) and a hydrocarbon solvent. From about 2% to about 10% rare earth element, preferably from about 3% to about 8%, is present in the solutions. The rare earth tris (organophosphate) solutions are stable from precipitation of the rare earth tris (organophosphate) for at least about fifteen (15) days, preferably for at least about twenty (20) days and most preferably at least about thirty (30) days. A process for preparing these solutions is described herein. A stabilizing additive, acid, glycol or mixtures thereof, is utilized to inhibit precipitation. The molar ratios of free acid, glycol and/or water to the rare earth element are controlled to inhibit precipitation.

专利号:US-2005209355-A1
优先权日:2004-03-22
标 题:[Novel Reactions and the Products of Such Reactions]
发明人：ROITMAN LIPA L
权利人:ROITMAN LIPA L
摘要:A process for the synthesis of novel compounds is described comprising reacting tetrachloroethylene with substances containing active methylene group in the presence of free radical initiators. Also, a process for grafting tetrachloroethylene is described comprising reacting these compounds with polymers containing active methylene group in the presence of free radical initiators. Furthermore, a method of conducting such reactions to high conversion is described, comprising conducting the reactions in the reflux condensate. The present invention provides a novel and high yield route for heretofore unobtainable materials.

专利号:WO-8503665-A1
优先权日:1984-02-15
标题:Synthesis of polyurethane products
发明人：HOSTETTLER FRITZ
权利人:PIRRI JAQUELYN P; HOSTETTLER FRITZ
摘要:Wide range of polyurethane products, e.g., cellular, dense elastomer, and integral skin microcellular products, obtained by the reaction of (a) a polyisocyanate compound, (b) a polyol, (c) optionally a chain extender and/or blowing agent with/without other known additives, (d) in the presence of a nonhydroxyl flow modifier characterized by carbon and hydrogen atoms, at least one and, generally, a plurality of oxyalkylene groups, and at least one urethane, $(1,5)omicronp. Several of the polyurethane products exhibit unique properties, e.g., foamed articles with capability to conduct static electricity, soft elastomers characterized by improved coefficient of friction, etc. Several classes of the flow modifiers are novel per se. The polyurethane products can be synthesized via the one shot or prepolymer process. Multipackage systems, in particular, two and three component systems are useful in molding operations, e.g., manufacture of shoe soles.

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.