CAS: 115372-36-6; 3-Hydroxyadamantan-1-Yl Methacrylate

相似化合物

115522-15-1 122066-43-7 216581-76-9

上下游产品

CAS号79-41-4 甲基丙烯酸 | CAS号5001-18-3 1,3-二羟基金刚烷 | CAS号93942-70-2 prop-1-en-2-yl ...

1-甲基乙烯基甲基丙烯酸酯 以90%的收率获得3-羟基-1-金刚烷基甲基丙烯酸酯
参考文献:Polymerizable Adamantane Derivatives And Process For Producing The Same
标题:Polymerizable Adamantane Derivatives And Process For Producing The Same

专利信息

专利号:US-7399806-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers
发明人：BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG
权利人:SYMYX TECHNOLOGIES INC
摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

专利号:US-7250475-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:US-2007185276-A1
优先权日:2003-06-26
标 题:Synthesis of Photresist Polymers

专利号:KR-20090102733-A
优先权日:2006-12-27
标 题 :Method for synthesis of hyperbranched polymer, hyperbranched polymer, resist composition, semiconductor integrated circuit, and method for production of semiconductor integrated circuit

专利号:KR-20090103860-A
优先权日:2006-12-28
标题:Process for synthesis of hyperbranched polymer, hyperbranched polymer, resist compositions, semiconductor integrated circuits, and process for production of semiconductor integrated circuits