CAS: 3070-86-8; N,N'-(Oxybis(4,1-Phenylene))Diacetamide

上下游产品

CAS号108-24-7 乙酸酐 | CAS号101-80-4 4,4'-二氨基二苯醚(ODA) | CAS号100-00-5 对硝基氯苯 | CAS号101-63-3 4,4'-二硝基二苯醚 | CAS号100-02-7 对硝基苯酚 | CAS号103-90-2 对乙酰氨基苯酚 | CAS号824-78-2 4-硝基苯酚钠 | CAS号2687-41-4 N-(4-(4-氨基苯氧基)苯基)乙酰胺 | CAS号6149-33-3 4-氨基-4'-硝基二苯醚 | CAS号3273-78-7 Benzenamine,4,4... | CAS号2676-59-7 3,3',4,4'-四氨基二苯基醚 | CAS号3070-87-9 Acetamide,N,N'-...

4,4-二硝基二苯醚置于三氯化铁,甲烷,肼体系中,用 1,4-二氧六环,氯苯 作为反应溶剂,化学反应 2.0H,反应生成 N,N-(氧代二-4,1-亚苯基)二乙酰胺
参考文献:Synthesis And Structure Of Di[methoxy(Ethoxy)Carbonylamino-1H-Benzimidazol-5-Yl] Ethers
标题:Synthesis And Structure Of Di[methoxy(Ethoxy)Carbonylamino-1H-Benzimidazol-5-Yl] Ethers
摘要:开发了一种制备di[methoxy(Ethoxy)Carbonylamino-1H-Benzimidazol-5-Yl]醚的方法,该方法通过甲基或乙基氯甲酸酯与氰胺钠反应,然后将所得的甲基或乙基氰基氨基甲酸酯与4-(3,4-二氨基苯氧基)-1,2-苯二胺在酸性溶液中反应.
DOI:10.1007/s11176-005-0459-8

专利信息

专利号:US-6569598-B2
优先权日:1998-12-01
标题 :Solvent resistant photosensitive compositions
发明人：ZEBALA JOHN A
权利人:SYNTRIX BIOCHIP INC
摘要:Photoresist compositions and methods are provided for preparing photoresist films that are stable and impermeable to a broad range of organic solvents. Photoresist films provided herein may be photopatterned by selectively applying light, and may be stripped from a surface using unreactive agents. Photopatterned films may be used, for example, to selectively direct organic reagents to a solid support for the purpose of performing regionally selective solid-phase chemical synthesis with micron-scale resolution.