专利号:US-9703192-B2 优先权日:2012-09-15 标 题:Onium compounds and methods of synthesis thereof 发明人:LABEAUME PAUL J 权利人:ROHM & HAAS ELECT MAT 摘要:New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.
专利号:US-7399806-B2 优先权日:2003-06-26 标 题:Synthesis of photoresist polymers 发明人:BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG 权利人:SYMYX TECHNOLOGIES INC 摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
专利号:US-2003235777-A1 优先权日:2001-12-31 标题 :Phenolic polymers, methods for synthesis thereof and photoresist compositions comprising same 发明人:GRONBECK DANA A; BARCLAY GEORGE G 权利人:SHIPLEY CO LLC 摘要:The invention provides phenolic polymers, and methods for synthesis and photoresists that comprise such polymers. Synthetic methods of the invention include providing a polymer that contains esterified meta-phenolic units, and removing the ester group preferably by hydrolysis to provide a polymer with meta-phenolic units.
专利号:US-7250475-B2 优先权日:2003-06-26 标 题:Synthesis of photoresist polymers
专利号:US-8043786-B2 优先权日:2003-03-05 标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions 发明人:EBATA SATOSHI; WANG YONG; NISHIMURA ISAO 权利人:JSR CORP 摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.
专利号:US-2008248418-A1 优先权日:2007-04-04 标 题:Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom