CAS: 14040-05-2; Copper(Ii)Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionate)

该化合物是与Cu(C11H19O2)2的配方协调化合物.这种热稳定,挥发性复合物广泛用于化学蒸气沉降(CVD)和原子层沉积(ALD)过程,用于制造铜薄膜和纳米材料,其高纯度和可预见分解行为使其适合于在微电子和光电子应用中精确沉积.大宗三丁基基组提高有机溶剂的溶性,减少分子间相互作用,改进胶片的统一性.此外,其湿度阻力和与工业沉积系统兼容性有助于其先进材料合成的可靠性.

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    海关参考信息

    专利信息


    专利号:US-2024360125-A9
    优先权日:2021-02-22
    标 题 :2-substituted bicyclo[1.1.1]pentanes
    发明人:MACMILLAN DAVID W; GARRY OLIVIA L; LIANG YUFAN; HEILMANN MICHAEL
    权利人:UNIV PRINCETON
    摘要:Provided herein are 2-substituted bicyclo[1.1.1]pentane (BCP) compounds, as well as methods of making the 2-substituted BCP compounds and methods of derivatizing the 2-substituted BCP compounds, particularly at the 2-position. The 2-substituted BCP compounds described herein are useful building blocks in the synthesis of a variety of products, including pharmaceuticals, polymers, liquid crystals, monolayers and supramolecular structures.

    专利号:US-11542600-B2
    优先权日:2009-10-26
    标题 :Synthesis and use of precursors for ALD of group VA element containing thin films

    专利号:US-11351478-B2
    优先权日:2018-09-06
    标题 :Oil skimmer with oleophilic coating
    发明人:DARLING SETH B; ELAM JEFFREY W
    权利人:UCHICAGO ARGONNE LLC
    摘要:A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.

    专利号:US-11548798-B2
    优先权日:2019-04-23
    标 题 :Compressible foam electrode
    发明人:YOUNG MATTHIAS JOHN; BARRY EDWARD F; ELAM JEFFREY W
    权利人:UCHICAGO ARGONNE LLC
    摘要:A foam electrode comprising surface treatment by the steps of: 1) impregnating soft compressible polymeric foams with a conductive coating via sequential infiltration synthesis and 2) functionalizing the chemically altered voids with an ultrathin redox coating to enhance capacitive deionization (CDI). The redox coating will allow treated foam to absorb ions under the application of a bias, and mechanical compression/decompression. The CDI apparatus uses the void volume of the foam in the uncompressed state to flow liquids through it while the compressed state is used to enhance desalination by limiting the diffusion pathways for the ions to find an adsorption surface.

    专利号:US-11814400-B2
    优先权日:2008-04-25
    标 题 :Synthesis and use of precursors for ALD of tellurium and selenium thin films

    专利号:CN-115322215-B
    优先权日:2022-10-18
    标 题 :Synthesis method of silicon-containing electron transport material
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    合成参考文献


    参考文献:10.1007/978-3-030-37153-1_8
    摘要:Alema F, Osinsky A. Metalorganic Chemical Vapor Deposition 1. 2020. In: Springer Series in Materials Science.
    参考文献:10.1134/s0036024424700997
    摘要:Bespyatov MA, Chernyaikin IS, Kuzin TM, Stabnikov PA, Gelfond NV. Low-Temperature Thermodynamic Properties of Cu(C11H19O2)2: A Universal Description of the Heat Capacity of Metal Dipivaloylmethanates. Russ. J. Phys. Chem. 2024 Sep;98(9):1901–7. doi: 10.1134/s0036024424700997.
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