叔丁基锂置于四氯化硅体系中,用 正戊烷 用作溶剂,化学反应 24.0H,以60%的收率获得叔丁基三氯硅烷 参考文献:原位生成的铜 (II) 物种催化二氢硅烷对映选择性羟基化为手性硅烷醇 标题:原位生成的铜 (II) 物种催化二氢硅烷对映选择性羟基化为手性硅烷醇 摘要:铜 (II) 介导的σ复分解与前手性二氢硅烷已成功用于有效合成 Si-手性硅烷醇以及许多其他相关的 Si-手性骨架.该反应取决于通过卤代烷对铜 (I) 进行单电子转移氧化连续生成具有催化活性的铜 (II),以及使用多齿阴离子 N,N,P-配体进行有效的立体控制. Doi:10.1002/anie.202205743
专利信息
专利号:US-5973095-A 优先权日:1997-04-21 标题 :Synthesis of hydrogensilsesquioxane and organohydridosiloxane resins 发明人:HACKER NIGEL P; KRAJEWSKI TODD; LEFFERTS SCOTT 权利人:ALLIED SIGNAL INC 摘要:Novel processes for preparing hydridosiloxane and organohydridosiloxane resins are disclosed. The processes of the invention broadly provide for the steps of contacting a silane monomer with a solid state catalyst in the presence of a reaction mixture that includes a nonpolar, e.g., hydrocarbon, solvent, and a polar solvent, e.g., alcohol and water. The process is conducted under conditions effective to catalytically convert said silane monomer into hydridosiloxanes and organohydridosiloxanes. Recovery of the products is advantageously aided by the ease of separating the solid state catalyst from the reaction mixture. Hydridosiloxanes and organohydridosiloxanes resins produced by the processes of the invention are also provided.
专利号:US-6395825-B1 优先权日:1999-06-09 标题 :Process for synthesis of silicone resin 发明人:BECKER GREGORY SCOTT; CARPENTER II LESLIE EARL; KING RUSSELL KEITH; MICHINO TETSUYUKI; MOYER ERIC SCOTT; YEAKLE CRAIG ROLLIN 权利人:DOW CORNING; DOW CORNING ASIA LTD 摘要:A method for hydrolyzing chlorosilanes having at least three chlorine atoms bonded to each silicon atom to form silicone resins. The method comprises adding at least one of hydridotrichlorosilane, tetrachlorosilane, or organotrichlorosilane to a two-phase mixture comprising a non-polar organic solvent, an aqueous phase comprising 0 to about 43 weight percent hydrochloric acid, and a surface active compound selected from the group consisting of organosulfates described by formula R2SO4H and alkali metal salts thereof, where R2 is selected from the group consisting of alkyl groups comprising about 4 to 16 carbon atoms and alkylphenyl groups comprising 7 to about 22 carbon atoms.
专利号:US-2022355262-A1 优先权日:2019-07-22 标题 :System and method for manufacturing water-based hydrophobic aerogels and aerogel composites 发明人:SACHITHANADAM MAHESH; KHORASGANI SOGHRATI ELMIRA; NATARAJAN GAYATHRI 权利人:KROSSLINKER PTE LTD 摘要:Embodiments of the present invention provide users with a system and method for manufacturing water-based hydrophobic aerogels and aerogel composites. The system and method can be carried out in a manner which is more rapid than typical ways and can be readily scalable. The method of manufacture is useful for producing water based hydrophobic aerogels and aerogel composites on a large scale with good homogeneity and consistency. Advantageously, the method of manufacture also has the benefit of a shorter processing time due to the vacuum homogenizing and mixing processes, the use of microwave assisted vacuum freeze drying for ease of synthesis of water-based hydrophobic aerogels.
专利号:US-6429327-B1 优先权日:1999-01-21 标题 :Organometallic catalysts 发明人:SIMS PHILIP FRANKLIN; SCHWINDEMAN JAMES ANTHONY 权利人:FMC CORP 摘要:Processes for the synthesis of substituted silanes from alkyl magnesium compounds using a mixture of catalysts. The catalyst systems include both a copper halide and a salt of a Group IA, IIA, IIA, or IVA element or a transition metal.
专利号:US-6340734-B1 优先权日:1998-09-03 标题:Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method 发明人:LIN QINGHUANG; ANGELOPOULOS MARIE; KATNANI AHMAD D; SOORIYAKUMARAN RATNAM 权利人:IBM 摘要:Novel silsesquioxane polymers are formed by methods which avoid the use of BBr 3 . The novel silsesquioxane polymers are especially useful in negative photoresist compositions and photolithographic processes. Alternatively, improved silsesquioxane polymer-containing negative photoresist compositions are obtained by using a polymer component containing a blend of silsesquioxane polymer and non-silsesquioxane polymer. The photoresist compositions provide improved dissolution characteristics enabling the use of 0.26N TMAH developer. The photoresist compositions also provide improved thermal characteristics enabling use of higher processing temperatures. The photoresist compositions are especially useful in a multilayer photolithographic processes and are capable of producing high resolution.
专利号:US-9416147-B2 优先权日:2014-04-03 标题 :Preparation of silazane compound 发明人:TONOMURA YOICHI; KUBOTA TOHRU 权利人:SHINETSU CHEMICAL CO 摘要:A silazane compound useful as synthesis intermediates for paint additives, polymer modifiers, pharmaceuticals and agricultural chemicals is efficiently prepared by reaction of a halosilane compound with an amino-containing compound in a solvent which is the same silazane compound as the target product.