CAS: 763-69-9; Ethyl 3-Ethoxypropanoate

相似化合物

111-35-3 623-72-3 4324-38-3

上下游产品

CAS号64-17-5 乙醇 | CAS号140-88-5 丙烯酸乙酯 | CAS号462-95-3 二乙氧基甲烷 | CAS号503-66-2 3-羟基丙酸 | CAS号67-64-1 丙酮 | CAS号78-94-4 丁烯酮 | CAS号57-57-8 丙内酯 | CAS号141-52-6 乙醇钠 | CAS号111-13-7 2-辛酮 | CAS号78097-85-5 ethyl 2- bromo-... | CAS号4324-38-3 3-乙氧基丙酸 | CAS号51036-80-7 2-(2-乙氧乙基)苯并咪唑 | CAS号2974-30-3 (Z)-2-(乙氧基甲基)-3... | CAS号879125-59-4 3t-ethoxy-2-eth... | CAS号89793-12-4 2-氯嘧啶-5-羧酸乙酯 | CAS号95928-49-7 2-羟基嘧啶-5-羧酸乙酯 | CAS号140-88-5 丙烯酸乙酯 | CAS号57401-76-0 2-氨基嘧啶-5-甲酸乙酯 | CAS号111-35-3 1,3-丙二醇单乙醚 | CAS号33458-27-4 2-氧-1,2,3,4-四氢嘧...

二乙氧基甲烷置于硫酸,乙酸酐体系中,用92%的收率获得产物3-乙氧基丙酸乙酯
参考文献:Process For The Preparation Of Alkyl 3-Alkoxypropionates
标题:Process For The Preparation Of Alkyl 3-Alkoxypropionates
摘要:本发明公开了一种改进的方法,通过在酰亚胺酸酐和浓缩或浓硫酸存在的催化剂作用下,将含有至少七个碳原子的烷基3-烷氧基丙酸酯与含有五个或更多碳原子的二烷氧基甲烷反应,制备烷基3-烷氧基丙酸酯.

专利信息

专利号:US-2018171086-A1
优先权日:2016-12-16
标题 :Large area monolayer of perfluoro polymers
发明人：SUN HAORAN
权利人:SOUTH DAKOTA BOARD OF REGENTS
摘要:Synthesis and growth of large area free-standing ultra-thin two-dimensional (2D) polymeric films including 2D covalent organic frameworks (COF) are achieved by utilizing fluorocarbon-soluble fluorinated aldehyde derivatives and hydrocarbon-soluble amine derivatives at a liquid-liquid interface of respective fluorocarbon and hydrocarbon solvents.

专利号:US-8940925-B2
优先权日:2009-01-27
标题:Method for purifying the azeotropic fraction generated during the synthesis of N,N-dimethyl aminoethyl acrylate
发明人：PAUL JEAN-MICHEL; GRAIRE CORALIE; RIEHL AUDREY
权利人:PAUL JEAN-MICHEL; GRAIRE CORALIE; RIEHL AUDREY; ARKEMA FRANCE
摘要:The invention relates to a method for producing N,N-dimethylaminoethyl acrylate by the transesterification reaction of an alykl acrylate by N1N-dimethylaminoethanol, and more particularly relates to a method for purifying the azeotropic fraction generated during said reaction, thereby enabling the recycling thereof on the alkyl acrylate production unit. The aim of the method of the invention is in particular to remove the acetaldehyde and the dialkoxyethane contained in the azeotropic fraction, either by the direct distillation of the azeotropic fraction or by the distillation of the aqueous phase resulting from the water scrubbing of the azeotropic fraction.

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-3579568-A
优先权日:1965-08-18
标题 :Synthesis of carboxylic acids from ethylene and carbon monoxide and noble metal compounds
发明人：HECK RICHARD F; HENRY PATRICK M
权利人:HERCULES POWDER CO
摘要:THE DISCLOSED PROCESS IS A METHOD FOR PRODUCING CARBOXYLIC ACIDS BY CARBNYLATION OF OLEFINIC HYDROCARBONS. AN OLEFIN SUCH AS ETHYLENE, AND WATER OR AN ACID SUCH AS ACETIC ACID, ARE BROUGHT INTO CONTACT WITH CARBON MONOXIDE IN THE PRESENCE OF A COMPOUND OF A GROUP VIII NOBLE METAL SUCH AS PALLADIUM AT A TEMPERATURE IN THE RANGE OF 25* TO 250*C. USING ETHYLENE AND ACETIC ACID AS REACTANTS, THE PRODUCT CONTAINS B-ACETOXYPROPIONIC ACID. A REDOX AGENT SUCH AS CUPRIC CHLORIDE MAY BE USED TO EFFECT REGENERATION OF THE NOBEL METAL COMPOUND.

专利号:US-10947189-B2
优先权日:2017-08-12
标 题:Online continuous flow process for the synthesis of organic peroxides using hydrogen peroxide as raw material
发明人：MA BING; PAN SHUAI; SHU XINLIN
权利人:SHANGHAI HYBRID CHEM TECH
摘要:An online continuous flow production process for directly preparing organic peroxides by using hydrogen peroxide as a raw material. This production process uses hydrogen peroxide, catalyst, and an oxidation substrate as a raw material. Substrate will be turned to designated peroxides sequentially through oxidation and workup. This process is performed in a plug-and-produce integrated continuous flow reactor, and the raw materials are continuously fed to the reactor. So, specified peroxide can be continuously obtained at the outlet of the plug-and-produce integrated continuous flow reactor.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.