CAS: 817-95-8; Ethyl 2-Ethoxyacetate

相似化合物

627-03-2 6634-17-9 3938-96-3

上下游产品

CAS号623-73-4 重氮乙酸乙酯 | CAS号64-17-5 乙醇 | CAS号6065-82-3 二乙氧基乙酸乙酯 | CAS号462-95-3 二乙氧基甲烷 | CAS号201230-82-2 carbon monoxide | CAS号141-52-6 乙醇钠 | CAS号105-39-5 氯乙酸乙酯 | CAS号627-03-2 乙氧基乙酸 | CAS号408538-34-1 triethoxy-ethene | CAS号37555-99-0 乙氧基-丙二酸二乙酯 | CAS号18295-59-5 2-丙基戊醛 | CAS号74-96-4 溴乙烷 | CAS号623-86-9 2-乙酰氧基乙酸乙酯 | CAS号141-78-6 乙酸乙酯 | CAS号105-36-2 溴乙酸乙酯 | CAS号79-14-1 羟基乙酸 | CAS号627-03-2 乙氧基乙酸 | CAS号5452-75-5 环已乙酸乙酯 | CAS号101168-47-2 1-甲氧基-3-吡啶-2-基-2-丙酮

2,2-二乙氧基乙酸乙酯置于碘化钛(Iv)体系中,用 乙腈 作为反应溶剂,以100%的收率获得产物2-乙氧基乙酸乙酯
参考文献:α-烯丙氧基-α-三甲基甲硅烷氧基乙酸酯在四碘化钛促进的还原性亚氨基羟醛反应中的应用:快速获得β-氨基-α-羟基酯
标题:α-烯丙氧基-α-三甲基甲硅烷氧基乙酸酯在四碘化钛促进的还原性亚氨基羟醛反应中的应用:快速获得β-氨基-α-羟基酯
摘要:在四碘化钛的作用下,α-烯丙氧基-α-三甲基甲硅烷氧基乙酸酯与亚胺的还原亚氨基羟醛反应以非常好的收率获得产物β-氨基-α-羟基酯.
DOI:10.1246/cl.2002.888

专利信息

专利号:US-11028057-B2
优先权日:2018-02-28
标题:Process for the synthesis of 6-chloromethyluracil
发明人：MORANA FABIO; GOBBATO STEFANO; ROLETTO JACOPO; PAISSONI PAOLO
权利人:PROCOS SPA
摘要:The invention relates to a process for the synthesis of 6-chloromethyluracil (6-(chloromethyl)pyrimidin-2,4(1H,3H)-dione) from ethyl 4-chloroacetoacetate and S-methylisothiourea hemisulfate via isolation of the novel intermediate 6-(chloromethyl)-6-hydroxy-2-(methylthio)-5,6-dihydropyrimidin-4(1H)-one, and its subsequent treatment with aqueous sulfuric acid. Formula (I).

专利号:EP-0082618-B1
优先权日:1981-12-23
标题 :Method of preparing a polymeric coating composition
摘要:A method of preparing a storage-stable one-part reactive liquid thermal curing polymeric coating composition from an isocyanate-functional polymeric compound which has a substantial portion of its isocyanate groups masked with an isocvanate masking agent, and a crosslinking agent which is substantially insoluble in aprotic solvents. These liquid compositions are homogeneous even when free of solvents. Preferably the crosslinking agent is a crystalline polyol. The method involves the synthesis of a solubilizing oligomer which is formed by the partial reaction of the crosslinking agent and the unmasked isocyanate-functional polymeric compound. The thermal curing of these compositions results in polymeric coatings which possess superior physical properties. These cured coatings are particularly useful in the manufacture of retroreflective sheeting.

专利号:US-4530859-A
优先权日:1981-12-23
标 题:Method of preparing a polymeric coating composition from a blocked isocyanate-functional polymeric compound and a crosslinking agent which is insoluble in aprotic solvents
发明人：GRUNZINGER JR RAYMOND E
权利人:MINNESOTA MINING & MFG
摘要:A method of preparing a storage-stable one-part reactive liquid thermal curing polymeric coating composition from an isocyanate-functional polymeric compound which has a substantial portion of its isocyanate groups masked with an isocyanate masking agent, and a crosslinking agent which is substantially insoluble in aprotic solvents. These liquid compositions are homogeneous even when free of solvents. Preferably the crosslinking agent is a crystalline polyol. The method involves the synthesis of a solubilizing oligomer which is formed by the partial reaction of the crosslinking agent and the unmasked isocyanate-functional polymeric compound. The thermal curing of these compositions results in polymeric coatings which possess superior physical properties. These cured coatings are particularly useful in the manufacture of retroreflective sheeting.

专利号:WO-2015036522-A1
优先权日:2013-09-13
标题:Process for the preparation and isolation of (s)-3-amino-n-cyclopropyl-2,2-dialkoxyhexanamide and (s)-tert-butyl(1-(cyclopropylamino)-2,2-dialkoxy-1-oxohexan-3-yl)carbamate and use thereof for the preparation of telaprevir
发明人：BARTH ROLAND; BENITO-GARAGORRI DAVID; WILHELM THORSTEN
权利人:SANDOZ AG
摘要:The present invention refers to processes for preparing (1 S ,3a R, 6aS)-2-[(2Sv)-2-[[(2S)-2- Cyclohexyl-2-(pyrazine-2-carbonylamino)acetyl]amino]-3,3-dimethylbutanoyl]- N -[(3S)-1-(cyclopropylamino)-1,2-dioxohexan-3-yl]-3,3a,4,5,6,6a-hexahydro-1 H -cyclopenta[c] pyrrol-1-carboxamid via novel cyclic anhydrides as intermediates. The cyclic anhydrides can easily be reacted with cyclopropylamine to provide the intermediates (S)-3-Amino- N -cyclopropyl-2,2-dialkoxyhexanamide and (S)-tert-Butyl (1-(cyclopropylamino)-2,2-dialkoxy-1-oxohexan-3-yl)carbamate. The present invention also refers to intermediates of the process for preparing telaprevir and processes for the synthesis of said intermediates.

专利号:US-8475998-B2
优先权日:2010-12-20
标 题 :Compound synthesis method, microarray, acid-transfer composition, and biochip composition
发明人：YUN HYOJIN; YOO CHANGEUN; KIM MYUNG-SUN; KIM SOO-KYUNG; NISHIKAWA KOUJI; GOTO HIROFUMI; MIYAMOTO HIDETOSHI
权利人:YUN HYOJIN; YOO CHANGEUN; KIM MYUNG-SUN; KIM SOO-KYUNG; NISHIKAWA KOUJI; GOTO HIROFUMI; MIYAMOTO HIDETOSHI; SAMSUNG ELECTRONICS CO LTD; JSR CORP
摘要:A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed area of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.