CAS: 1002-67-1; 1-Ethoxy-2-(2-Methoxyethoxy)Ethane

上下游产品

1,1-bis-[2-(2-methoxy-ethoxy)-ethoxy]-ethane 2-(2-methoxyethoxy)ethyl alcohol ethoxyethoxyethanol (1,4,7,10-tetraoxacyclododecane)

Alkaline Earth Salt Of/the/ Methylsulfuric Acid置于镍体系中,化学反应生成二乙二醇单甲醚,二乙二醇甲乙醚
参考文献:Us2397514
标题:Us2397514

专利信息

专利号:US-2005209355-A1
优先权日:2004-03-22
标 题:[Novel Reactions and the Products of Such Reactions]
发明人：ROITMAN LIPA L
权利人:ROITMAN LIPA L
摘要:A process for the synthesis of novel compounds is described comprising reacting tetrachloroethylene with substances containing active methylene group in the presence of free radical initiators. Also, a process for grafting tetrachloroethylene is described comprising reacting these compounds with polymers containing active methylene group in the presence of free radical initiators. Furthermore, a method of conducting such reactions to high conversion is described, comprising conducting the reactions in the reflux condensate. The present invention provides a novel and high yield route for heretofore unobtainable materials.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

专利号:US-8475998-B2
优先权日:2010-12-20
标 题 :Compound synthesis method, microarray, acid-transfer composition, and biochip composition
发明人：YUN HYOJIN; YOO CHANGEUN; KIM MYUNG-SUN; KIM SOO-KYUNG; NISHIKAWA KOUJI; GOTO HIROFUMI; MIYAMOTO HIDETOSHI
权利人:YUN HYOJIN; YOO CHANGEUN; KIM MYUNG-SUN; KIM SOO-KYUNG; NISHIKAWA KOUJI; GOTO HIROFUMI; MIYAMOTO HIDETOSHI; SAMSUNG ELECTRONICS CO LTD; JSR CORP
摘要:A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed area of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.

专利号:US-2018009038-A1
优先权日:2015-02-23
标 题 :Method for nanoparticle purification
发明人：IKEDA YASUYUKI; MARUKO TOMOHIRO; TAKEUCHI MASASHI
权利人:FURUYA METAL CO LTD
摘要:A method for purifying nanoparticles by which a large amount of nanoparticles can be obtained in a safe manner and in a short time as compared to a conventional method for purifying nanoparticles. A method for purifying nanoparticles by which nanoparticles are purified from a dispersion liquid in which nanoparticles are dispersed in a solvent A used in synthesis of the nanoparticles, the method including: a mixing step of mixing the dispersion liquid, a solvent B that is miscible with the solvent A, and a solvent C that forms two phases together with the solvent B; a concentrating step of concentrating the nanoparticles in a phase of the solvent C; a washing step of forming a third phase containing the nanoparticles in the phase of the solvent C; and a purifying step of extracting the third phase and removing the solvent C from the third phase.

专利号:US-8679724-B2
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

专利号:EP-0713488-B1
优先权日:1993-08-10
标题 :[1,3,4]triazolo [1,5-al]pyridines used as intermediate products for the synthesis of dyes