CAS: 84-60-6; 2,6-Dihydroxyanthracene-9,10-Dione

上下游产品

CAS号99-06-9 3-羟基苯甲酸 | CAS号860597-60-0 4-hydroxy-2-(4-... | CAS号120-12-7 蒽 | CAS号63712-32-3 2-(4-methoxy-be... | CAS号860561-54-2 4-amino-2-(4-me... | CAS号100-66-3 苯甲醚 | CAS号84-50-4 蒽醌二磺酸二钠 | CAS号84-65-1 蒽醌 | CAS号7664-93-9 硫酸 | CAS号7732-18-5 水 | CAS号101488-73-7 2,6-二羟蒽 | CAS号143814-17-9 (6-cyanato-9,10... | CAS号131268-46-7 2,6-diphenylant... | CAS号159638-87-6 2,6-二([1-(叔丁基)-... | CAS号36319-03-6 2,6-二甲氧基蒽 | CAS号35697-33-7 2,6-bis[2-(diet... | CAS号332083-42-8 2,6-bis(2-ethyl... | CAS号33927-45-6 3-hydroxy-2,4,6... | CAS号1747-94-0 2,6-Diacetoxy-9...

苯甲醚置于boron Trioxide,Ammonium Hydroxide,三氯化铝,Iron Hydroxide,硫酸体系中,化学反应生成 2,6-二羟基蒽醌
参考文献:Mitter; Dutt,Journal Of The Indian Chemical Society,1936,Vol. 13,P. 228,233
标题:Mitter; Dutt,Journal Of The Indian Chemical Society,1936,Vol. 13,P. 228,233

专利信息

专利号:US-6712949-B2
优先权日:2001-07-22
标 题:Electrochemical synthesis of hydrogen peroxide
发明人：GOPAL RAMANATHAN
权利人:ELECTROSYNTHESIS CO INC
摘要:Improved methods and devices for the synthesis of hydrogen peroxide employing redox catalysts in a gas diffusion electrode or membrane electrode assembly in a semi-chemical/electrochemical system for the production of high purity, stable, usually acidic, aqueous solutions of peroxide at high conversion efficiencies without requiring organic solvents.

专利号:US-12291513-B2
优先权日:2021-05-03
标 题:Pyridinium derivatives made by hydrothermal synthesis for use as anolytes in electrochemical cells
发明人：FENG DAWEI; LYU XIULIANG; SULLIVAN PATRICK; LI WENJIE
权利人:WISCONSIN ALUMNI RES FOUND
摘要:Pyridinium derivatives, methods of making the pyridinium derivatives, and electrochemical cells that use the pyridinium derivatives as anolytes are provided. The pyridinium derivatives have a redox core with two or more pyridinium groups and substituents at pyridinium ring nitrogen atoms. The pyridinium derivatives can be made by reacting pyridyl reactant molecules having two or more pyridyl groups with water-soluble derivatizing reactant molecules via a hydrothermal synthesis.

专利号:US-2009054649-A1
优先权日:2005-09-22
标题 :Bridged Organosilane and Production Method Thereof
发明人：SHIMADA TOYOSHI; GOTO YASUTOMO; INAGAKI SHINJI; MIZOSHITA NORIHIRO; IKAI MASAMICHI
权利人:TOYOTA CHUO KENKYUSHO KK; TOYOSHI SHIMADA
摘要:Provided is a bridged organosilane, which has a large complex organic group, and which is useful in the synthesis of a mesoporous silica and a light-emitting material, and a production method of the bridged organosilane. The bridged organosilane is expressed by the following general formula (1): n n n n n n n n n n [in the formula (1), q represents an integer in a range from 2 to 4, X 1 — represents a substituent selected from the group consisting of substituents expressed by the following general formulae (2) to (5): n n n n n n n n n n (in the formulae (2) to (5), R 1 represents alkyl group having 1 to 5 carbon atoms, R 2 represents an allyl group, and n represents an integer in a range from 0 to 3, and m represents an integer in a range from 0 to 6), and A 1 represents an organic group expressed by, for example, the following general formula (6): n n n n n n n n n n (in the formula (6), Y 1 < represents a substituent expressed by, for example, Oâ•?<)].

专利号:US-2003019758-A1
优先权日:2001-07-22
标 题 :Electrochemical synthesis of hydrogen peroxide

专利号:WO-03010360-A1
优先权日:2001-07-22
标 题 :Electrochemical synthesis of hydrogen peroxide

专利号:US-8889334-B2
优先权日:2001-11-15
标题:Spin-on anti-reflective coatings for photolithography
发明人：KENNEDY JOSEPH T; BALDWIN-HENDRICKS TERESA
权利人:HONEYWELL INT INC
摘要:Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.