专利号:US-2008207950-A1 优先权日:2004-12-22 标 题:Enantioselective Synthesis of a Sterically Hindered Amine 发明人:BERENS ULRICH; MALAN CHRISTOPHE; KIRNER HANS JURG 权利人:CIBA SC HOLDING AG 摘要:Compounds of the formula (I) wherein R is phenyl, or phenyl substituted by Cl, Br, C 1 -C 4 alkyl or CF 3 ; R 1 is H or methyl or ethyl; R 2 is H or methyl or acyl; R 3 is H or methyl; R′ 4 is —CH 3 or â•?CH 2 ; may be obtained in high enantiopurity by hydrogenation of a compound of the formula (II) wherein R and R 3 are as in formula (I); A is acyl; and R 4 is —CH 3 or â•?CH 2 ; in the presence of a chiral Rhodium or Ruthenium catalyst. Residues R 1 as methyl or ethyl and/or R 2 as H or methyl may subsequently be introduced without racemization by deacylation and optional alkylation.
专利号:US-9884879-B2 优先权日:2011-06-14 标 题:Method of synthesizing siloxane monomers and use thereof 发明人:PAULASAARI JYRI 权利人:SILECS OY 摘要:A method for preparation and polymerization of siloxane monomers of Formula I is presented. The synthesis includes the selective reaction between silanol containing unit and alkoxy containing units in the presence of basic catalyst. The siloxane monomers of the invention can be used for preparation of siloxane polymers with good flexibility and cracking threshold, and functional sites, useful for applications requiring low metal content in semiconductor industry.
专利号:US-8889334-B2 优先权日:2001-11-15 标题:Spin-on anti-reflective coatings for photolithography 发明人:KENNEDY JOSEPH T; BALDWIN-HENDRICKS TERESA 权利人:HONEYWELL INT INC 摘要:Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
专利号:CN-107519930-B 优先权日:2017-09-02 标 题:Preparation method of binuclear imidazole ion solid base for catalytic synthesis of biodiesel
专利号:US-9290381-B2 优先权日:2013-09-26 标 题:Functionalized single-walled nanotubes and methods thereof 发明人:NAIR SANKAR; KANG DUN-YEN; BRUNELLI NICHOLAS A; JONES CHRISTOPHER W 权利人:GEORGIA TECH RES INST 摘要:Described are single-walled metal oxide nanotubes having a plurality of organic functional units or moieties bonded generally in a covalent manner to the inner wall of the single-walled nanotubes. Functionalization of the single-walled metal oxide nanotubes is performed in a single-step during synthesis of the nanotubes. The organic functional units are found dispersed throughout the length of the inner wall and not sterically hindered or contained at only the mouth or ends of the single-walled metal oxide nanotubes.
专利号:US-7678462-B2 优先权日:1999-06-10 标 题:Spin-on-glass anti-reflective coatings for photolithography 发明人:KENNEDY JOSEPH; BALDWIN TERESA; HACKER NIGEL P; SPEAR RICHARD 权利人:HONEYWELL INT INC 摘要:Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.